Long Service Life SiC Coated Graphite Portitorem Solar Wafer

Brevis descriptio:

Silius carbide novum genus ceramicorum est magno sumptu perficiendi et praestantia materiarum proprietatum. Ob features sicut altae roboris et duritiae, caliditas resistentiae, magna conductivity et chemica corrosio scelerisque resistentia, Silicon Carbide omnia media chemica fere sustinere potest. Ideo, SIC late utuntur in fodienda olei, chemica, machinatione et airspace, etiam energia nucleari et militari, peculiares suas postulationes in SIC habent. Aliquid normali applicatione offerre possumus annulos obsignantes ad sentinam, valvam et armaturam tutelarem etc.


Product Detail

Product Tags

commoda

Princeps caliditas oxidationis resistentia
Corrosion resistentia praeclara
Bonum Abrasionis resistentia
Princeps coefficiens caloris conductivity
Levitas, humilis densitas
Alta duritia
Lorem amet.

HGF (2)
HGF (1)

Applications

-War-repugnans campus: frutex, lamina, sandblasting COLLUM, cyclus oblinit, dolium stridor, etc.
-High Temperature Field: siC Slab, Exstinguitur Fornax Tubus, Radiant Tube, Fuscus, Calefactio Elementum, Rollerus, Radius, Calor Commutator, Frigidi Aeris Pipe, Exuro Nozzle, Thermocouple Tubus, SiC Navis, Kiln Car Structura, Setter, etc.
-Silicon Carbide Semiconductor: cymba lagana SiC, sic chuck, sic paxillum, sic cassette, sic diffusio tubi, laganum furca, patella suctio, guideway, etc.
-Silicon Carbide Sigillum Campi: omnia genera signandi anulum, gerentem, fruticem, etc.
- Campus Photovoltaicus: Cantilever Paddle, Molendum Ferocactus, Silicon Carbide Rollerus, etc.
-Lithium Pugna Field

WAFER (1)

laganum (2)

Corporalia De Proprietatibus Sic

Property Precium Methodus
Density 3.21 g/cc Sink-natat et dimensio
Imprimis calor 0.66 J/g °K Pulsus mico laser
Flexurae vires 450 MPa560 MPa 4 punctum anfractus, RT4 punctum flexus, 1300°
Fractura spissitudo 2.94 MPa m1/2 Microindentation
duritia 2800 Vicker's, 500g onus
Elasticus ModulusYoung's Modulus 450 GPa430 GPa 4 pt flecti, RT4 pt flecti, MCCC °C
Frumenti magnitudine 2 – 10 µm SEM

Scelerisque Proprietatibus SiC

Scelerisque Conductivity 250 W/m °K Modus laser mico, RT
Scelerisque Expansion (CTE) 4.5 x 10-6 °K Locus temp ad 950 °C, silica dilatometer

Technical Parameters

Item Unitas Data
RBSiC(SiSiC) NBSiC SSiC RSiC OSiC
SiC content % 85 75 99 99.9 ≥99
Liberum Pii content % 15 0 0 0 0
Max ministerium temperatus 1380 1450 1650 1620 1400
Density g/cm*3 3.02 2.75-2.85 3.08-3.16 2.65-2.75 2.75-2.85
Apertum poros % 0 13-15 0 15-18 7-8
Tendens vires 20℃ pa 250 160 380 100 /
Tendens robur 1200℃ pa 280 180 400 120 /
Modulus elasticitatis 20℃ Gpa 330 580 420 240 /
Modulus elasticitatis 1200℃ Gpa 300 / / 200 /
Scelerisque conductivity 1200℃ W/mK 45 19.6 100-120 36.6 /
Coefficiens scelerisque expansion K-1X10-6 4.5 4.7 4.1 4.69 /
HV Kg/mm2 2115 / 2800 / /

CVD carbida siliconis in superficie exteriore productorum carbidi siliconis ceramici recrystallized potest attingere puritatem plus quam 99,9999% ut obviam necessitatibus clientibus in industria semiconductoris.

Locus Semicera Opus
Locus operis semicera 2
Apparatus armorum
Rhoncus processus, purgatio chemica, CVD coating
Nostra religio

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