Semicera'sAzymum Cassettepars critica est in processu vestibulum semiconductoris, destinato ad lagana semiconductoris delicati secure tenendam et transportandam. TheAzymum Cassetteeximiam tutelam praebet, ita ut unumquodque laganum a contaminantibus et damnis corporis in tractandis, repono, et vectura custodiatur.
Constructus est summus puritatis, materiae chemicae repugnans, SemiceraAzymum Cassettesupremos gradus munditiae et firmitatis praestat, essentiales ad laganum integritatem conservandam in omni productionis statu. Subtilitas machinationis harum retaculorum permittit ut integrationem inconsutilem cum systematibus automatis tractandis, minimo periculo contagionis et damni mechanici.
ConsiliumAzymum Cassettebene sustinet etiam caeli fluxum et temperatum imperium, quod pendet pro processibus qui specificas condiciones environmental requirunt. Sive in cleanrooms sive in processus scelerisque, in semiceraAzymum Cassettemachinatum est ut restrictius postulata semiconductoris industriae occurrant, certas et constantes praebens effectus ad augendam efficientiam et qualitatem productam fabricandam.
Items | Productio | Inquisitionis | phantasma |
Crystal Parameters | |||
Polytypus | 4H | ||
Superficiem sexualis errore | <11-20 >4±0.15° | ||
Electrical Parameters | |||
Dopant | n-genus Nitrogenium | ||
Resistentia | 0.015-0.025ohm·cm | ||
Mechanica Parametri | |||
Diameter | 150.0±0.2mm | ||
Crassitudo | 350±25 μm | ||
Prima plana propensionis | [1-100]±5° | ||
Prima plana longitudo | 47.5±1.5mm | ||
Secundarium plana | Nullus | ||
TTV | ≤5 μm | ≤10 μm | ≤15 μm |
LTV | ≤3 μm(5mm*5mm) | ≤5 μm(5mm*5mm) | ≤10 μm(5mm*5mm) |
Arcum | -15μm ~ 15μm | -35μm ~ 35μm | -45μm ~ 45μm |
Warp | ≤35 μm | ≤45 μm | ≤55 μm |
Frons (Si-face) asperitas (AFM) | Ra≤0.2nm (5μm*5μm) | ||
Structure | |||
Micropipe density | <1 ea/cm2 | <10 ea/cm2 | <15 ea/cm2 |
Metallum immunditiae | ≤5E10atoms/cm2 | NA | |
BPD | ≤1500 ea/cm2 | ≤3000 ea/cm2 | NA |
TSD | ≤500 ea/cm2 | ≤1000 ea/cm2 | NA |
Ante Quality | |||
Front | Si | ||
Superficiem metam | Si-face CMP | ||
Particulas | ≤60ea/laganum (size≥0.3μm) | NA | |
Exasperat | ≤5ea/mm. Cumulativo longitudo ≤Diameter | Cumulative length≤2*Diameter | NA |
Orange cortices / foveas / maculas / striations / rimas / contagione | Nullus | NA | |
Ora eu / indents / fractura / hex p | Nullus | ||
Polytypus areis | Nullus | Cumulativo area≤20% | Cumulativo area≤30% |
Ante laser vestigium | Nullus | ||
Back Quality | |||
Retro metam | C-faciem CMP | ||
Exasperat | ≤5ea/mm,Cumulative length≤2*Diameter | NA | |
Retro defectus (ore eu / indents) | Nullus | ||
Retro asperitatem | Ra≤0.2nm (5μm*5μm) | ||
Back laser notati | I mm (a summo ore) | ||
Ore | |||
Ore | Chamfer | ||
Packaging | |||
Packaging | Epi-paratum in vacuo packaging Multi laganum cassette packaging | ||
*Nota "NA" significat petitionem nullam Items not mentioned may refer to SEMI-STD. |