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Dimidia partes Sic Epitaxial Equipment

Dimidium partes pro Sic Epitaxial Equipment Featured Image
  • Dimidia partes Sic Epitaxial Equipment

Brevis descriptio:

SiC obductis partibus graphitis ad apparatum SiC epitaxialem.

Productum introductio et usus: Tubus vicus conexus, gas transire potest ut basis rotationis lance, temperatura imperium

Fabrica locationis producti: in camera reactionis, non in contactu directo cum lagano

Pelagus products amni: cogitationes potentiae

Principalis terminus forum: nova industria vehicles


Product Detail

Product Tags

Sic CoatedGraphite Halfmoon Parskey component usus est in processibus semiconductoribus fabricandis, praesertim instrumento epitaxiali SiC. Technologia nostra patentata utimur ad dimidiam partem lunae summae puritatis, bonae uniformitatis ac optimae vitae servitutis, necnon altae chemicae resistentiae et possessiones scelerisque stabilitas.

 
Locus Semicera Opus
Locus operis semicera 2
Apparatus apparatus
Rhoncus processus, purgatio chemica, CVD coating
Nostra opera
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