SiC Epitaxy

Brevis descriptio:

Semicera consuetudo tenuis pelliculae (carbidi pii) SiC epitaxia subiectae praebet ad machinas carbidae Pii evolutionis. Weitai committitur ad comparandas qualitates productorum et pretia competitive, et expectamus diuturnum tempus socium tuum in Sinis esse.

 

Product Detail

Product Tags

SiC epitaxy (2)(1)

Product Description

4h-n 4inch 6inch dia100mm sic semen laganum 1mm crassitudine ad augmentum unctionis

Customzied size/2inch/3inch/4inch/6inch 6H-N/4H-SEMI/ 4H-N SIC ingots/Hy-N 4inch 6inch dia 150mm pii carbidi unico crystallo (sic) substrato laganaS/ Customzied as-cut sic wafersProduction 4inch gradus 4H-N 1.5mm SIC Wafers pro semine crystallo

De Pii Carbide (SiC) Crystal

Silicon carbide (SiC), etiam carborundum notum, est semiconductor continens pii et carbo cum formula chemica SiC. SiC adhibetur in electronicis semiconductoribus machinis quae ad altas temperaturas vel ad altas voltages operantur, vel utrumque. SiC est etiam una ex elementis principalibus ductus, substrata popularis est pro machinis crescentibus, et etiam inservit calori diffundentis in alto. potentia LEDs.

Descriptio

Property

4H-SiC, Single Crystal

6H-SiC, Single Crystal

Parameters cancellos

a=3.076 Å c=0.053 Å

a=3.073 Å c=15.117

Stacking Sequentia

ABCB

ABCACB

Mohs duritia

≈9.2

≈9.2

Density

3.21 g/cm3

3.21 g/cm3

Therm. Expansion Coefficient

4-5×10-6/K

4-5×10-6/K

Refractio Index @ 750nm

no = 2.61
ne = 2.66

no = 2.60
ne = 2.65

Dielectric Constant

c~9.66

c~9.66

Scelerisque Conductivity (N-type, 0.02 olim)

a~4.2 W/cm·K@298K
c~3.7 W/cm·K@298K

 

Scelerisque Conductivity (Semi-insulating)

a~4.9 W/cm·K@298K
c~3.9 W/cm·K@298K

a~4.6 W/cm·K@298K
c~3.2 W/cm·K@298K

Band-gap

3.23 eV

3.02 eV

Break-down Electrical Field

3-5×106V/cm

3-5×106V/cm

Saturatio Drift Velocitas

2.0×105m/s

2.0×105m/s

SiC lagana

Locus Semicera Opus Locus operis semicera 2 Apparatus armorum Rhoncus processus, purgatio chemica, CVD coating Nostra religio


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